Plasma nitriding with PECVD coatings using hollow cathode ion immersion technology
US11339464B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 1, 2019 |
| Grant date | May 24, 2022 |
| Priority date | — |
| Expiry date | Apr 9, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05B7/18
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Rapid plasma nitriding is achieved by harnessing the power and increased density of plasma discharges created by hollow cathodes. When opposing surfaces are maintained at the proper voltage, sub atmospheric pressure, and spacing, a phenomenon known as the hollow cathode effect creates additional hot oscillating electrons capable of multiple ionization events thereby increasing the number of ions and electrons per unit volume (plasma density). The present invention describes the harnessing of this phenomenon to rapidly plasma nitride metal surfaces and optionally rapidly deposit functional coatings in a continuous operation for duplex coatings.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.