Filter for impedance matching
US11342160B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 20, 2019 |
| Grant date | May 24, 2022 |
| Priority date | — |
| Expiry date | Jan 23, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH03H7/40
- WIPO fieldBasic communication processes
- WIPO sectorElectrical engineering
Abstract
In one embodiment, an RF impedance matching network for a plasma chamber is disclosed. The matching network includes an electronically variable capacitor (EVC) comprising discrete capacitors, each discrete capacitor having a corresponding switching circuit for switching in and out the discrete capacitor to alter a total capacitance of the EVC. Each switching circuit includes a diode operably coupled to the discrete capacitor to cause the switching in and out of the discrete capacitor, and a filter circuit parallel to the diode, the filter comprising a filtering capacitor in series with an inductor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.