Barrier structure based on MPMDT/XT copolyamide with a high Tg
US11345131B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 15, 2016 |
| Grant date | May 31, 2022 |
| Priority date | — |
| Expiry date | Feb 25, 2037 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/1383
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A barrier structure for the storage and/or transport of fluids, including at least one barrier layer (1) including an MPMDT/XT copolyamide in which: MPMDT is a unit with an amide motif having a molar ratio of between 5 and 50%, particularly between 5 and 45%, preferably between 15 and 45%, more preferably between 20 and 45%, where MPMD is 2-methyl pentamethylene diamine (MPMD) and T is terephthalic acid, XT being a unit with a majority amide motif having a molar ratio of between 50 and 95%, particularly between 55 and 95%, preferably between 55 and 85%, more preferably between 55 and 80%, where X is a C9 to C18, preferably C9, C10, C11 and C12, linear aliphatic diamine, and where T is terephthalic acid, the copolyamide having a melting point of 250° C.<Tf≤300° C. as determined according to the ISO norm 1 1357-3 (2013).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.