Systems and methods for coating surfaces
US11348759B2 · kind B2 · utility
1Cited by
11References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 2, 2018 |
| Grant date | May 31, 2022 |
| Priority date | — |
| Expiry date | Dec 24, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3288
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A chemical vapor deposition system for coating one or more workpieces is described herein. The deposition system includes a plurality of processing chambers which may be operated independently to increase throughput of the deposition system. Each chamber includes a modular fixture that is configured to maintain the workpieces in a predetermined arrangement which allows for a hollow cathode effect to be maintained in an Interior space of the chamber. The deposition system achieves significantly faster, higher-quality deposition and more complete, conformal coverage.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.