Patent · US Active

Corrosion-resistant structure for a gas delivery system in a plasma processing apparatus

US11348763B2 · kind B2 · utility

0Cited by
1References
9Claims
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Assignee

Inventors

Key dates

Filing dateMay 28, 2020
Grant dateMay 31, 2022
Priority date
Expiry dateMay 28, 2040

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/67069
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

Disclosed is a corrosion-resistant structure for a gas delivery system in a plasma processing apparatus. By providing a plating layer of corrosion-resistant material at the parts including the gas channel to avoid reacting with the delivered corrosive gas, metal and particle contaminations are reduced. By reversely mounting nozzles such that they reliably cover the plating layer inside the gas outlet holes, the disclosure prevents the corrosion-resistant material from being damaged by the plasma generated inside the cavity. By forming a corrosion-resistant yttrium oxide coating at the surfaces of the nozzles exposed to the cavity, the disclosure prevents the plasma from eroding the nozzles. The disclosure further leverages a flexible corrosion-resistant material, such as Teflon, to the sealing surfaces of the liner in contact with the dielectric window and the cavity, which improves the overall sealing effect of the liner. The disclosure may effectively enhance the corrosion-resistant and sealing properties of the liner and prolong its service life, as well as improving operating stability of the plasma processing apparatus.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.