Patent · US Active

Structures and method for growing diamond layers

US11348858B2 · kind B2 · utility

0Cited by
1References
18Claims
0Family size

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Key dates

Filing dateApr 21, 2020
Grant dateMay 31, 2022
Priority date
Expiry dateApr 21, 2040

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L23/481
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

An intermediate structure for forming a semiconductor device and method of making is provided. The intermediate device includes (i) a substrate comprising a Ga-based layer, and (ii) optionally, a metal layer on the substrate; wherein at least one of the Ga-based layer and, if present, the metal layer comprises at least a surface region having an isoelectric point of less than 7, usually at most 6.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.