Adjustable scan patterns for lidar system
US11353559B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 9, 2018 |
| Grant date | Jun 7, 2022 |
| Priority date | — |
| Expiry date | Jan 25, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01S17/10
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
In one embodiment, a lidar system includes a light source configured to emit pulses of light and a scanner configured to scan at least a portion of the emitted pulses of light along a scan pattern contained within an adjustable field of regard. The scanner includes a first scanning mirror configured to scan the portion of the emitted pulses of light substantially parallel to a first scan axis to produce multiple scan lines of the scan pattern, where each scan line is oriented substantially parallel to the first scan axis. The scanner also includes a second scanning mirror configured to distribute the scan lines along a second scan axis that is substantially orthogonal to the first scan axis, where the scan lines are distributed within the adjustable field of regard according to an adjustable second-axis scan profile.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.