Dielectric material, method of manufacturing thereof, and dielectric devices and electronic devices including the same
US11358904B2 · kind B2 · utility
1Cited by
21References
20Claims
0Family size
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Key dates
| Filing date | Feb 28, 2018 |
| Grant date | Jun 14, 2022 |
| Priority date | — |
| Expiry date | Jan 15, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01C7/008
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A dielectric material, a method of manufacturing thereof, and a dielectric device and an electronic device including the same. A dielectric material includes a layered metal oxide including a first layer having a positive charge and a second layer having a negative charge which are laminated, a monolayer nanosheet exfoliated from the layered metal oxide, a nanosheet laminate of the monolayer nanosheets, or a combination thereof, wherein the dielectric material includes a two-dimensional layered material having a two-dimensional crystal structure and the two-dimensional layered material is represented by Chemical Formula 1.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.