Cleaning formulation for removing residues on surfaces

US11359169B2 · kind B2 · utility

Assignee

• Fujifilm Electronic Materials U.S.A., Inc. · US

Inventors

• Tomonori Takahashi · Chita, JP
• Bing Du · Gilbert, US
• William A. Wojtczak · Santa Clara, US
• Thomas Dory · Gilbert, US
• Emil A. Kneer · Mesa, US

Key dates

• Filing date: Jan 24, 2022
• Grant date: Jun 14, 2022
• Expiry date: Jan 24, 2042

Classification

• Technology area (CPC —): General

Abstract

This disclosure relates to a cleaning composition that contains 1) at least one redox agent; 2) at least one first chelating agent, the first chelating agent being a polyaminopolycarboxylic acid; 3) at least one metal corrosion inhibitor, the metal corrosion inhibitor being a substituted or unsubstituted benzotriazole; 4) at least one pH adjusting agent, the pH adjusting agent being a base free of a metal ion; and 5) water. This disclosure also relates to a method of using the above composition for cleaning a semiconductor substrate.