Patent · US Active

Silicon-containing underlayers

US11360387B2 · kind B2 · utility

0Cited by

5References

15Claims

0Family size

Assignee

Rohm and Haas Electronic Materials LLC · US

Inventors

Li Cui · Westborough, US
Paul J. LaBeaume · Auburn, US
James F. Cameron · Brookline, US
Charlotte Cutler · Hopkinton, US
Shintaro Yamada · Shrewsbury, US
Suzanne M. Coley · Mansfield, US
Iou-Sheng Ke · Andover, US

Key dates

Filing date	Jun 29, 2018
Grant date	Jun 14, 2022
Priority date	—
Expiry date	Dec 12, 2040

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/091
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Methods of manufacturing electronic devices employing wet-strippable underlayer compositions comprising one or more condensed polymers having an organic polymer chain having pendently-bound moieties having an acidic proton and a pKa in water from −5 to 13 and having pendently-bound siloxane moieties are provided.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.