Patent · US Active

Method for manufacturing touch screen, display device

US11360618B2 · kind B2 · utility

0Cited by
0References
12Claims
0Family size

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Key dates

Filing dateAug 3, 2018
Grant dateJun 14, 2022
Priority date
Expiry dateApr 3, 2040

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG06F2203/04103
  • WIPO fieldComputer technology
  • WIPO sectorElectrical engineering

Abstract

A method for manufacturing a touch screen which includes: providing a substrate including a display area and a non-display area located around the display area; forming a first transparent conductive layer on a side of the substrate, and forming a metal layer on a surface of the first transparent conductive layer facing away from the substrate; forming a first photoresist pattern on the metal layer, at least a portion of the first photoresist pattern corresponding to a metal trace to be formed in the non-display area; performing an etching process by using the first photoresist pattern to form the metal trace; forming a second photoresist pattern only in one of the display area and the non-display area, and performing an etching process to form a first transparent conductive pattern in the display area.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.