Atomic layer deposition process for fabricating dielectric metasurfaces for wavelengths in the visible spectrum

US11366296B2 · kind B2 · utility

Assignees

• President and Fellows of Harvard College · US
• The Charles Stark Draper Laboratory, Inc. · US

Inventors

• Robert C. Devlin · Concord, US
• Mohammadreza Khorasaninejad · Cambridge, US
• Federico Capasso · Westfield, US
• Hongkun Park · Lexington, US
• Alexander A. HIGH · Brookline, US

Key dates

• Filing date: Nov 23, 2016
• Grant date: Jun 21, 2022
• Expiry date: Mar 10, 2037

Classification

• Technology area (CPC G): Physics
• CPC primary: G02B1/02
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A method of fabricating a visible spectrum optical component includes: providing a substrate; forming a resist layer over a surface of the substrate; patterning the resist layer to form a patterned resist layer defining openings exposing portions of the surface of the substrate; performing deposition to form a dielectric film over the patterned resist layer and over the exposed portions of the surface of the substrate, wherein a top surface of the dielectric film is above a top surface of the patterned resist layer; removing a top portion of the dielectric film to expose the top surface of the patterned resist layer and top surfaces of dielectric units within the openings of the patterned resist layer; and removing the patterned resist layer to retain the dielectric units over the substrate.