Patent · US Active

Method and apparatus for obtaining surface potential

US11366946B2 · kind B2 · utility

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10Claims
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Key dates

Filing dateAug 9, 2018
Grant dateJun 21, 2022
Priority date
Expiry dateJun 13, 2039

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG16C20/70
  • WIPO fieldComputer technology
  • WIPO sectorElectrical engineering

Abstract

The present disclosure provides a method and an apparatus for obtaining surface potential. The method comprises: obtaining parameter information of multiple target devices, wherein the parameter information includes: size, device structure, material parameter, and carrier mobility of each of the target devices at different temperatures, and the multiple target devices include: devices fabricated by using conventional materials and devices fabricated by using first new materials whose surface potentials have been determined, and the conventional materials include bulk materials and the first new materials include thin film materials; extracting surface potentials based on the size, the device structure, the material parameter and the mobility of each of the target devices under corresponding operating conditions; establishing a surface potential database based on the surface potentials and the parameter information; constructing a surface potential analytical model according to neural network based on the surface potential database; and determining the surface potential of a device fabricated by using a second new material by using the surface potential analytical model.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.