Layout analysis
US11367296B2 · kind B2 · utility
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2References
18Claims
0Family size
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Key dates
| Filing date | Jun 17, 2021 |
| Grant date | Jun 21, 2022 |
| Priority date | — |
| Expiry date | Jun 17, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06V2201/131
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A layout analysis method, an electronic device, and a non-transitory computer-readable storage medium are provided. The layout analysis method includes: obtaining coordinate information of a plurality of text lines in an image; creating a layout model of the image according to the coordinate information; analyzing a layout structure of the text lines based on the layout model; and determining an order of the text lines relative to each other based on the layout structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.