Polishing apparatus
US11369857B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 3, 2017 |
| Grant date | Jun 28, 2022 |
| Priority date | — |
| Expiry date | Jul 8, 2039 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA63C2203/12
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
The invention relates to apparatus for polishing a running base that comprises a blade with two opposing blade edges separated one from the other by an intermediate section; the polishing apparatus comprising: a support body, and blade alignment guide means; wherein the support body is capable of carrying a polishing surface which comprises: a profile which is adapted to conform with one or more portions of the intermediate section; and wherein the blade alignment guide means comprise one or more pairs of first and second blade alignment guides, which first and second blade alignment guides in each pair are separated from each other by the polishing surface, and further wherein the blade alignment guide means is adapted to receive and/or guide and/or constrain a running base so that when the intermediate section between the two edges of the running base is brought into contact with the polishing surface, there is no contact between the polishing surface and any part of the two opposing blade edges of the running base.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.