Method and apparatus for manufacturing microfluidic chip with femtosecond plasma grating
US11370657B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Apr 14, 2021 |
| Grant date | Jun 28, 2022 |
| Priority date | — |
| Expiry date | Jul 5, 2041 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81C2900/00
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
The present disclosure discloses a method and apparatus for manufacturing a microfluidic chip with a femtosecond plasma grating. The method is characterized in that two or more beams of femtosecond pulse laser act on quartz glass together at a certain included angle and converge in the quartz glass, and when pulses achieve synchronization in time domain, the two optical pulses interfere; Benefited by constraint of an interference field, only one optical filament is formed in one interference period; and numbers of optical filaments are arranged equidistantly in space to form the plasma grating. The apparatus for manufacturing the microfluidic chip includes a plasma grating optical path, a microchannel processing platform, and a hydrofluoric acid ultrasonic cell.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.