Patent · US Active

Bonding wire for semiconductor device

US11373934B2 · kind B2 · utility

3Cited by
0References
13Claims
0Family size

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Key dates

Filing dateDec 28, 2017
Grant dateJun 28, 2022
Priority date
Expiry dateDec 28, 2037

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2924/3651
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

Provided is a Pd coated Cu bonding wire for a semiconductor device capable of sufficiently obtaining bonding reliability of a ball bonded portion in a high temperature environment of 175° C. or more, even when the content of sulfur in the mold resin used in the semiconductor device package increases.The bonding wire for a semiconductor device comprises a Cu alloy core material; and a Pd coating layer formed on a surface of the Cu alloy core material; and contains 0.03 to 2% by mass in total of one or more elements selected from Ni, Rh, Ir and Pd in the bonding wire and further 0.002 to 3% by mass in total of one or more elements selected from Li, Sb, Fe, Cr, Co, Zn, Ca, Mg, Pt, Sc and Y. The bonding wire can be sufficiently obtained bonding reliability of a ball bonded portion in a high temperature environment of 175° C. or more, even when the content of sulfur in the mold resin used in the semiconductor device package increases by being used.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.