Patent · US Active

Method for producing microstructures in a glass substrate

US11377387B1 · kind B1 · utility

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14Claims

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Assignee

LPKF LASER & ELECTRONICS AG · DE

Inventors

Roman Ostholt · Langenhagen, DE
Norbert Ambrosius · Kevelaer, DE

Key dates

Filing date	Apr 23, 2020
Grant date	Jul 5, 2022
Priority date	—
Expiry date	Apr 23, 2040

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB81C2201/0154
WIPO fieldMachine tools
WIPO sectorMechanical engineering

Abstract

A method for producing microstructures includes introducing modifications by a laser beam into a volume between two opposite outer surfaces of a glass substrate. An etching method is carried out which provides anisotropic material removal in one of the outer surfaces so as to produce recesses that have a conical shape. A layer that is resistant to an etching effect of the etching method is applied as a cover layer to only one outer surface. Then, a further etching method is carried out so that material is removed in the other outer surface until recesses of this other outer surface, which are produced and/or enlarged by the further etching method, have reached the cover layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.