Aluminum precursor and process for the generation of metal-containing films

US11377454B2 · kind B2 · utility

Assignees

• BASF SE
• Wayne State University · US

Inventors

• Charles H. Winter · Bloomfield, US
• Kyle Blakeney · Fremont, US
• Lukas Mayr · Ludwigshafen, DE
• David Dominique Schweinfurth · Ludwigshafen, DE
• Sabine Weiguny · Freinsheim, DE
• Daniel Waldmann · Aesch, CH

Key dates

• Filing date: Apr 10, 2019
• Grant date: Jul 5, 2022
• Expiry date: Apr 10, 2039

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C16/45553
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

The present disclosure is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. Described herein is a process for preparing metal-containing films including: