Deposition mask, deposition mask apparatus, manufacturing method of deposition mask, and manufacturing method of deposition mask apparatus
US11380546B2 · kind B2 · utility
7Cited by
1References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 24, 2019 |
| Grant date | Jul 5, 2022 |
| Priority date | — |
| Expiry date | Dec 24, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K50/00
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A deposition mask includes: a first mask having an opening formed therein; and a second mask superposed on the first mask and having a plurality of through-holes formed therein, the through-hole having a planar dimension smaller than a planar dimension of the opening; wherein: the deposition mask has a plurality of joints that join the second mask and the first mask to each other; the plurality of joints are arranged along an outer edge of the second mask; and a notch is formed at a position in the outer edge of the second mask, the position corresponding to a space between the adjacent two joints.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.