System for a semiconductor fabrication facility and method for operating the same
US11380566B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 25, 2020 |
| Grant date | Jul 5, 2022 |
| Priority date | — |
| Expiry date | Dec 25, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG05B2219/45031
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A system for a semiconductor fabrication facility includes a manufacturing tool including a load port, a maintenance crane, a rectangular zone overlapping with the load port of the manufacturing tool, a plurality of first sensors at corners of the rectangular zone, an OHT vehicle, a second sensor on the OHT vehicle, a third sensor on the load port, and a control unit. The first sensors are configured to detect a location of the maintenance crane and to generate a first location data. The second sensor is configured to generate a second location data. The control unit is configured to receive the first location data of the maintenance crane and the second location data of the OHT vehicle. The control unit further sends signals to the second sensor and the third sensor or to cut off the signal to the second sensor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.