Transparent pantograph pattern
US11386314B2 · kind B2 · utility
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12References
20Claims
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Key dates
| Filing date | Aug 29, 2020 |
| Grant date | Jul 12, 2022 |
| Priority date | — |
| Expiry date | Aug 29, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T11/60
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Methods and systems for rendering a transparent pantograph pattern. A background path and a foreground path for a pantograph pattern can be determined. An intersection internal to the background path and external to foreground path that is to be marked can be defined. Areas to be masked can be defined with respect to the pantograph pattern. The pantograph pattern can be then rendered as a transparent vector pattern pantograph by writing a background based on the background path and a foreground based on the foreground path and the areas defined as masked.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.