Patent · US Active

Diffuser material of synthetically produced quartz glass and method for the manufacture of a molded body consisting fully or in part thereof

US11390556B2 · kind B2 · utility

0Cited by
4References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 13, 2017
Grant dateJul 19, 2022
Priority date
Expiry dateOct 15, 2037

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC03C2203/54
  • WIPO fieldOther special machines
  • WIPO sectorMechanical engineering

Abstract

A diffuser material of synthetically produced, pore-containing quartz glass and a method for the manufacture of a molded body consisting fully or in part thereof. The diffuser material has a chemical purity of at least 99.9% SiO2, a cristobalite content of not more than 1%, and a density in the range of 2.0 to 2.18 g/cm3. Starting therefrom, to indicate a diffuser material which is improved with respect to diffuse reflectivity with Lambertian behavior over a wide wavelength range, high material homogeneity and UV radiation resistance, the quartz glass has a hydroxyl group content in the range of at least 200 wt. ppm and at least 80% of the pores have a maximum pore dimension of less than 20 μm.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.