Diffuser material of synthetically produced quartz glass and method for the manufacture of a molded body consisting fully or in part thereof
US11390556B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 13, 2017 |
| Grant date | Jul 19, 2022 |
| Priority date | — |
| Expiry date | Oct 15, 2037 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C2203/54
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
A diffuser material of synthetically produced, pore-containing quartz glass and a method for the manufacture of a molded body consisting fully or in part thereof. The diffuser material has a chemical purity of at least 99.9% SiO2, a cristobalite content of not more than 1%, and a density in the range of 2.0 to 2.18 g/cm3. Starting therefrom, to indicate a diffuser material which is improved with respect to diffuse reflectivity with Lambertian behavior over a wide wavelength range, high material homogeneity and UV radiation resistance, the quartz glass has a hydroxyl group content in the range of at least 200 wt. ppm and at least 80% of the pores have a maximum pore dimension of less than 20 μm.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.