Method for manufacturing a device for forming at least one focused beam in a near zone
US11396474B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 6, 2018 |
| Grant date | Jul 26, 2022 |
| Priority date | — |
| Expiry date | Jun 22, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B2006/12102
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The disclosure concerns a method for manufacturing a device for forming at least one focused beam in a near zone, from an electromagnetic wave incident on said device. The method includes depositing a dielectric material layer with a first refractive index on a substrate layer, creating at least one cavity by a microfabrication technique in the dielectric material layer, the device for forming at least one focused beam in a near zone of the substrate layer (110) and the dielectric material layer, filling the at least one cavity with a material having a second refractive index lower than the first refractive index, determining a deviation between a measured focused beam radiation angle obtained from the device for forming at least one focused beam in a near zone and an expected focused beam radiation angle and modifying locally at least one of the two refractive indexes according to the deviation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.