Patent · US Active

Ferroelectric based transistors

US11398568B2 · kind B2 · utility

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20Claims
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Assignee

Inventors

Key dates

Filing dateJun 17, 2020
Grant dateJul 26, 2022
Priority date
Expiry dateJun 17, 2040

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D86/60

Abstract

The present disclosure relates to semiconductor structures and, more particularly, to ferroelectric based transistors and methods of manufacture. The ferroelectric based transistor includes: a semiconductor-on-insulator substrate including a semiconductor material, a buried insulator layer under the semiconductor material and a substrate material under the semiconductor channel material; a ferroelectric capacitor under the buried insulator layer and which includes a bottom electrode, a top electrode and a ferroelectric material between the bottom electrode and the top electrode; a gate stack over the semiconductor material; a first terminal contact connecting to the bottom electrode of the ferroelectric capacitor; and a second terminal contact connecting to the top electrode of the ferroelectric capacitor.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.