Patent · US Active

Systems for removing air from the fluid circuits of a plasma processing system

US11400188B2 · kind B2 · utility

1Cited by
142References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 4, 2020
Grant dateAug 2, 2022
Priority date
Expiry dateSep 4, 2040

Classification

  • Technology area (CPC A)Human Necessities
  • CPC primaryA61M2202/046
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

The present specification discloses plasma processing systems that include a number of different fluid flow circuits that are defined by sources of fluid, fluid lines, fluid flow paths, waste containers, a mixer, a separator, valves, and a pump. The systems also include a connector tube and a solvent extraction device, wherein the connector tube and solvent extraction device are configured to be alternatively inserted in a same position along a fluid flow line. In addition, the systems include a controller that is configured to execute a plurality of programmatic instructions to open and close each of a first fluid flow line valve, a second fluid flow line valve, a third fluid flow line valve, and a fourth fluid flow line valve in a predetermined sequence to either enable or prevent a flow of fluid through various fluid flow lines.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.