Patent · US Active

Long-wave absorbing photoinitiators

US11401287B2 · kind B2 · utility

0Cited by
10References
18Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 18, 2021
Grant dateAug 2, 2022
Priority date
Expiry dateFeb 18, 2041

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC08F220/18
  • WIPO fieldPharmaceuticals
  • WIPO sectorChemistry

Abstract

Compounds according to general formula (I) in which M is Ge or Sn, RAr is R1, R2, R3, R4, R5, independently of one another in each case, are —H, —F, —Cl, —OR6, —SR6, —N(R6)2, —CF3, —CN, —NO2, —COOR6, —CONHR6, a branched, cyclic or preferably linear C1-20 alkyl, C2-20 alkenyl, C1-20 alkyloxy or a C2-20 alkenoxy radical, which can be interrupted one or more times by O, S or —NR6— and substituted by one or more polymerizable groups and/or radicals R6, R6 is H, a branched, cyclic or preferably linear C1-20 alkyl or C2-20 alkenyl radical, R7 is a chemical bond, an n-valent aromatic radical or a branched, cyclic or preferably linear C1-20 alkylene radical, which can be interrupted one or more times by O, S or —NR6— and substituted by one or more polymerizable groups, ═O and/or radicals R6, n is 2 or 3 and m is 0 or 1. The compounds are particularly suitable as photoinitiators for radical polymerization and in particular for the production of dental materials.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.