Mask protective module, pellicle having the same, and lithography apparatus having the same
US11402746B2 · kind B2 · utility
0Cited by
0References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 11, 2019 |
| Grant date | Aug 2, 2022 |
| Priority date | — |
| Expiry date | Nov 28, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/027
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A mask protective module is provided. The mask protective module includes a frame and a membrane supported by the frame. The membrane may include regions of which light transmittances, heat conductivities and/or strengths are different from each other.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.