Patent · US Active

Production of a semiconductor device

US11404611B2 · kind B2 · utility

0Cited by
1References
17Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 16, 2018
Grant dateAug 2, 2022
Priority date
Expiry dateNov 19, 2038

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10H20/0362

Abstract

In an embodiment a method for producing a semiconductor device includes providing a carrier with a semiconductor component arranged on the carrier, providing a layer arrangement on the carrier, the layer arrangement adjoining the semiconductor component and comprising a first and a second flowable layer, wherein the first layer is formed on the carrier and then the second layer is formed on the first layer, wherein the first layer comprises particles, wherein a density of the first layer is greater than a density of the second layer, and wherein a lateral wetting of the semiconductor component with the first layer occurs such that the first layer comprises a first configuration comprising a curved layer surface laterally with respect to the semiconductor component, and centrifuging the carrier such that the first layer comprises a second configuration as a result, wherein the first layer cannot return to the first configuration since the second layer is arranged on the first layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.