Patent · US Active

Method for etching a phosphate source using acid

US11407640B2 · kind B2 · utility

0Cited by
11References
13Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 10, 2018
Grant dateAug 9, 2022
Priority date
Expiry dateFeb 9, 2039

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC01B25/327
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

Process of acid attack with sulphuric acid of a phosphate source comprising calcium or not comprising calcium for a predetermined time period ranging from 20 to 180 minutes in the conditions wherein the molar ratio of sulphate from the sulphuric acid and possibly from the phosphate source to the calcium present in the phosphate source ranges from 0.6 to 0.8, and the content in P2O5 in the attack tank is of less than 6%.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.