Patent · US Active

Method of preparing graphdiyne-based material and a substrate for use in such material preparation process

US11407641B2 · kind B2 · utility

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12Claims

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Assignee

CITY UNIVERSITY OF HONG KONG · CN

Inventors

Chunyi Zhi · Tsuen Wan, CN
Qi Yang
Ying Guo · Chongqing, CN
Zijie Tang · Beijing, CN

Key dates

Filing date	Jun 8, 2020
Grant date	Aug 9, 2022
Priority date	—
Expiry date	Jan 27, 2041

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC01P2002/20
WIPO fieldChemical engineering
WIPO sectorChemistry

Abstract

A method of preparing graphdiyne-based material and a substrate for use in such material preparation process. The method includes the steps of: disposing an alkynye-based monomer on a substrate; maintaining a planar structure of each of a plurality of molecules of the monomer on a surface of the substrate; and initiating polymerization of the monomer on the substrate to synthesize a two-dimensional crystalline layer of the graphdiyne-based material on the substrate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.