Etching composition for thin film containing silver, method for forming pattern and method for manufacturing a display device using the same
US11407943B2 · kind B2 · utility
2Cited by
3References
17Claims
0Family size
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Key dates
| Filing date | Sep 19, 2019 |
| Grant date | Aug 9, 2022 |
| Priority date | — |
| Expiry date | Sep 19, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/231
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An etching composition for a silver-containing thin film includes an inorganic acid compound, a carboxylic acid compound, a sulfonic acid compound, a glycol compound, a nitrogen-containing dicarbonyl compound, a metal-based oxidizer, and water.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.