Hardmask composition, hardmask layer and method of forming patterns
US11409197B2 · kind B2 · utility
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2References
10Claims
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Key dates
| Filing date | Dec 20, 2019 |
| Grant date | Aug 9, 2022 |
| Priority date | — |
| Expiry date | Jun 22, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/30
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A hardmask composition, a hardmask layer, and a method of forming patterns, the composition including a solvent; and a compound represented by Chemical Formula 1,
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.