Pulse reverse current high rate electrodeposition and charging while mitigating the adverse effects of dendrite formation
US11411258B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 4, 2019 |
| Grant date | Aug 9, 2022 |
| Priority date | — |
| Expiry date | Feb 3, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01M10/052
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The problem of high rate electrodeposition of metals such as copper during electrowinning operations or high rate charging of lithium or zinc electrodes for rechargeable battery applications while avoiding the adverse effects of dendrite formation such as causing short-circuiting and/or poor deposit morphology is solved by pulse reverse current electrodeposition or charging whereby the forward cathodic (electrodeposition or charging) pulse current is “tuned” to minimize dendrite formation for example by creating a smaller pulsating boundary layer and thereby minimizing mass transport effects leading to surface asperities and the subsequent reverse anodic (electropolishing) pulse current is “tuned” to eliminate the micro- and macro-asperities leading to dendrites.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.