Cleaning method, apparatus and use
US11414633B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 28, 2016 |
| Grant date | Aug 16, 2022 |
| Priority date | — |
| Expiry date | Oct 24, 2036 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/12
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A method for cleaning a substrate which is or comprises a textile, the method comprising agitating the substrate and a cleaning composition comprising: i. cleaning particles comprising a thermoplastic polyamide and a hydrophilic material at least part of which is located inside the cleaning particle, said cleaning particles having an average particle size of from 1 to 100 mm; and ii. a liquid medium. An apparatus suitable for performing said method comprising a rotatable cleaning chamber and a particle storage tank containing the cleaning particles. Use of the cleaning particles for cleaning a substrate which is or comprises a textile.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.