Patent · US Active

Electrolytic chlorine dioxide gas manufacturing device

US11414767B2 · kind B2 · utility

0Cited by
1References
9Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 16, 2020
Grant dateAug 16, 2022
Priority date
Expiry dateAug 4, 2040

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC01B11/022
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

The present invention provides a chlorine dioxide manufacturing device that can accurately control the amount of chlorine dioxide produced. The present invention provides a chlorine dioxide gas manufacturing device comprising an electrolysis chamber, a liquid surface level measuring chamber, and a bubbling gas feeding device. The electrolysis chamber and the liquid surface level measuring chamber each comprises an electrolytic solution and a gas, wherein the electrolytic solution comprises an aqueous chlorite solution, and the electrolysis chamber and the liquid surface level measuring chamber are joined to each other above each liquid surface via a gas piping and joined to each other below each liquid surface via an electrolytic solution piping so that the height of the electrolytic solutions contained in each chamber are substantially equal.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.