Patent · US Active

Microscope and method for determining an aberration in a microscope

US11415789B2 · kind B2 · utility

0Cited by

3References

15Claims

0Family size

Assignee

LEICA MICROSYSTEMS CMS GMBH · DE

Inventors

Christian Schumann · Gießen, DE
Alexander W. Weiss · Linden, DE
Andreas Lotter · Wetzlar, DE

Key dates

Filing date	Oct 27, 2020
Grant date	Aug 16, 2022
Priority date	—
Expiry date	Mar 16, 2041

Classification

Technology area (CPC G)Physics
CPC primaryG02B21/34
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A microscope includes an optical imaging system with an adjustable corrector, a microscope drive, a position sensitive detector, an optical measuring system and a control unit. The optical measuring system configured to form first and second measuring light beams, direct the measuring light beams into an entrance pupil of the optical imaging system eccentrically with first and second distances to the optical axis thereof, receive first and second reflection light beams, and direct the reflection light beams onto the position sensitive detector. The control unit is configured to record positions of the reflection light beams on the position sensitive detector, and determine an aberration based on the recorded positions.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.