Patent · US Active

Imprint template, method of fabricating imprint template, apparatus for performing method of fabricating imprint template, imprint mold for fabricating an imprint template

US11420361B2 · kind B2 · utility

0Cited by
1References
15Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 17, 2019
Grant dateAug 23, 2022
Priority date
Expiry dateJul 13, 2040

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/0002
  • WIPO fieldOther special machines
  • WIPO sectorMechanical engineering

Abstract

The present disclosure generally relates to nanostructure manufacturing. A method for fabricating an imprint template includes providing a first substrate including a first electrode layer on a first base layer and a plurality of first convex portions on a surface of the first electrode layer; providing a second substrate including a second electrode layer on a second base layer, a second resist layer on the second electrode layer, and a plurality of second convex portions on a surface of the second resist layer farthest from the second base layer, supplying electrical signals to the first electrode layer and the second electrode layer to produce an electric field between the plurality of first convex portions and the plurality of second convex portions; and forming the imprint template on the second substrate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.