Patent · US Active

Methods and systems for mask alignment in manufacturing process of arrays

US11420941B2 · kind B2 · utility

0Cited by
7References
15Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 29, 2018
Grant dateAug 23, 2022
Priority date—
Expiry dateDec 20, 2040

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F9/7088
  • WIPO fieldOrganic fine chemistry
  • WIPO sectorChemistry

Abstract

Provided herein are molecules and salts thereof, arrays containing molecules and salts thereof, solid supports containing molecules and salts thereof, kits containing molecules or salts thereof, and methods of determining alignment of photolithographic masks comprising molecules or salts thereof.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.