Antireflection film, optical element, and optical system
US11422290B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 9, 2020 |
| Grant date | Aug 23, 2022 |
| Priority date | — |
| Expiry date | Oct 8, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B15/145
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
An antireflection film is provided on a substrate and includes an interlayer, a silver-containing metal layer containing silver, and a dielectric layer, which are laminated in this order on a side of a substrate, in which the interlayer is a multilayer film having at least two layers in which a layer of high refractive index having a relatively high refractive index and a layer of lower refractive index having a relatively low refractive index are alternately laminated, the dielectric layer has a surface exposed to air, and the dielectric layer is a multilayer film including a silicon-containing oxide layer, a magnesium fluoride layer, and an adhesion layer provided between the silicon-containing oxide layer and the magnesium fluoride layer and configured to increase adhesiveness between the silicon-containing oxide layer and the magnesium fluoride layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.