Siloxane mitigation for laser systems
US11424592B2 · kind B2 · utility
1Cited by
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26Claims
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Key dates
| Filing date | Oct 15, 2020 |
| Grant date | Aug 23, 2022 |
| Priority date | — |
| Expiry date | Oct 15, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S5/4068
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In various embodiments, the concentration and deposition of siloxane materials within components of laser systems, such as laser resonators, is reduced or minimized utilizing mitigation systems that may also supply gas having low siloxane levels into multiple different components in series or in parallel.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.