Process for depositing a layer
US11427499B2 · kind B2 · utility
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2References
17Claims
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Key dates
| Filing date | Nov 20, 2018 |
| Grant date | Aug 30, 2022 |
| Priority date | — |
| Expiry date | Nov 20, 2038 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C2218/152
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A process for depositing on a surface of a substrate a layer based on a metal oxide doped with magnesium or a mixed metal oxide containing magnesium. The process includes providing a substrate having a surface, forming a gaseous mixture comprising a non-halogenated source of a metal and a source of magnesium, delivering the gaseous mixture to the surface of the substrate, and depositing the layer based on a metal oxide doped with magnesium or a mixed metal oxide containing magnesium on the surface of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.