Vat resin with additives for thiourethane polymer stereolithography printing
US11427718B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Oct 25, 2018 |
| Grant date | Aug 30, 2022 |
| Priority date | — |
| Expiry date | Apr 29, 2040 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB29K2075/00
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A vat resin for three-dimensional stereolithography printing of a thiourethane polymer part comprising a liquid mixture including a first type of monomer, a second type of monomer, a photolatent base decomposable upon exposure to a light to form a non-nucleophillic base catalyst having a pKa greater than 7, an anionic step-growth polymerization reaction inhibitor having an acidic group configured to form an acid-base pair with the non-nucleophillic base and a light absorber having an absorbance in the liquid mixture that is greater than an absorbance of the photolatent base at a wavelength of the light used for the exposure. Methods of preparing the vat resin and three-dimensional stereolithography printing a thiourethane polymer part using the vat resin are also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.