Patent · US Active

Planar heating structure

US11432378B2 · kind B2 · utility

0Cited by

1References

20Claims

0Family size

Assignee

Cambrios Film Solutons Corporation · VG

Inventors

Ho-Hsun Chi · Hengshan, TW
Ying-Che Chen · Tangxia, CN
Yu ZHANG · Nanhu, CN
Hebo Yang · Xiamen, CN
Fu-Yu Su · New Taipei, TW
Chao Gao · Guilin, CN
Shu-Guang Zhu · Fujian, CN
Chun-Ya Tang · Xiamen, CN
Wen-Da Chen · Zhangzhou, CN

Key dates

Filing date	Sep 24, 2019
Grant date	Aug 30, 2022
Priority date	—
Expiry date	Jul 13, 2040

Classification

Technology area (CPC H)Electricity
CPC primaryH05B2214/04
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A planar heating structure is disclosed. The planar heating structure includes a glass substrate layer, a nanometallic transparent conductive layer, and a first passivation layer. The nanometallic transparent conductive layer is disposed on the glass substrate layer and receives a voltage to generate heat energy. The first passivation layer is disposed on the nanometallic transparent conductive layer and completely covers the nanometallic transparent conductive layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.