Material provision device for a stereolithography apparatus
US11433600B2 · kind B2 · utility
0Cited by
3References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 29, 2017 |
| Grant date | Sep 6, 2022 |
| Priority date | — |
| Expiry date | Mar 23, 2038 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB33Y30/00
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
The invention shows a material provision device for a stereolithography apparatus to provide print material (16), in particular a photopolymer, to be cured, wherein the material provision device (10) surrounds an in particular limp material cartridge (12) which receives the print material (16) on all sides and (UV) light-proof, and the material cartridge (12) comprises an outlet (20) via which the print material (16) may be dispensed and which is received in a connection (43) or a spout in the material provision device (10) and is at least partially supported thereon or therein or seals against it.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.