Deposition mask apparatus, mask support mechanism, and production method for deposition mask apparatus
US11434559B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 25, 2021 |
| Grant date | Sep 6, 2022 |
| Priority date | — |
| Expiry date | Jun 25, 2041 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A deposition mask apparatus including a frame, a supporter including a plurality of supporting members fixed to the frame, and a deposition mask fixed to the frame is provided. The plurality of supporting members include at least a first supporting member that is closest to an intermediate position between a third portion and a fourth portion of the frame and a second supporting member that is located closer to the third portion of the frame than the first supporting member. The first supporting member in a state of warping downward from the frame with a first warping amount supports the deposition mask from below. The second supporting member in a state of warping downward from the frame with a second warping amount that is smaller than the first warping amount supports the deposition mask from below.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.