System for analyzing impact and puncture resistance
US11441985B2 · kind B2 · utility
0Cited by
8References
20Claims
0Family size
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Key dates
| Filing date | Apr 30, 2018 |
| Grant date | Sep 13, 2022 |
| Priority date | — |
| Expiry date | Aug 25, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2203/0494
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and a system for analyzing a physical characteristic of a film sample are described herein. The system includes a material holder system configured to hold the film sample; a dart testing system configured to test a physical characteristic of the film sample; and a moving system configured to move the held film sample to be analyzed or tested between stations. The moving system is configured to move the held film sample in the material holder system to the dart testing system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.