Polarizer substrate and manufacturing method thereof
US11442210B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 20, 2020 |
| Grant date | Sep 13, 2022 |
| Priority date | — |
| Expiry date | Apr 12, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/13362
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A polarizer substrate includes a substrate, a reflective layer, and a metal pattern layer. The reflective layer is located on the substrate and has a transmission area and a reflective area. The metal pattern layer is located on the reflective layer and the substrate. The metal pattern layer includes a polarizer structure and a microstructure. The polarizer structure includes a plurality of grid lines overlapping the transmission area. A thickness of each of the grid lines is 200 nm to 500 nm, a width of each of the grid lines is 30 nm to 70 nm, and a distance between each adjacent two of the grid lines is 30 nm to 70 nm. The microstructure overlaps the reflective area, and a thickness of the microstructure is 20 nm to 500 nm.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.