Method for producing aluminum platter
US11447661B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Dec 27, 2017 |
| Grant date | Sep 20, 2022 |
| Priority date | — |
| Expiry date | Dec 27, 2037 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05D2202/25
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
In one aspect, the present disclosure provides a method for producing an aluminum platter, which can improve the smoothness of the substrate surface before a magnetic layer is formed thereon and can provide a hard disk substrate that can be processed into a medium with a high yield. In another aspect, the present disclosure relates to a method for producing an aluminum platter, including the following steps 1 and 2: step 1: bringing a composition containing a compound (component A) that has at least one structure represented by the following formula (I) and has a molecular weight between 50 and 100,000 inclusive into contact with a substrate surface of a Ni—P plated aluminum alloy substrate; and step 2: forming a magnetic layer on the substrate obtained in the step 1.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.