Method for monitoring dry state of electrode substrate
US11448597B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 17, 2018 |
| Grant date | Sep 20, 2022 |
| Priority date | — |
| Expiry date | Jan 3, 2039 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E60/50
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The present invention relates to an apparatus and method for monitoring a dry state of an electrode substrate in which electrode slurry is applied to a collector. The monitoring method comprises emitting light onto a surface of the electrode substrate; receiving the light reflected by the surface of the electrode substrate; and analyzing a luminous intensity or spectrum of the received light to estimate a drying rate of the electrode substrate.The apparatus includes a light emitting part emitting light from a light source onto a surface of the electrode substrate; a light receiving part receiving the light reflected by the surface of the electrode substrate; and a computing device analyzing a luminous intensity or spectrum of the received light and comparing analyzed characteristics of the light with the reference data of the reflected light to the drying rate of the electrode substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.